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?/span>?/span>?/span>?/span>?/span>?/span>?/span>E?/span>?/span>?/span>?/span>?/span>?/span>U?/span>?/span>?/span>?/span>U?/span>c?/span>?/span>?/span>?/span>p?/span>l?/span>?/span>I?/span>所?/span>?/span>?/span>?/span>?/span>?/span>?/span>ACS Applied Materials & Interfaces?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>Effects of Oxygen Vacancies and Cation Valence States on the Triboelectric Property of Substoichiometric Oxide Films?/span>?/span>?/span>?/span>Q?/span>DOI: 10.1021/acsami.1c09248Q?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>Q?/span>?/span>?/span>?/span>l?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>U?/span>c?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>Q?/span>q?/span>q?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>退?/span>?/span>?/span>?/span>?/span>?/span>着?/span>I?/span>?/span>?/span>退?/span>?/span>?/span>?/span>?/span>?/span>Q?/span>开?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>l?/span>?/span>?/span>?/span>TiO2-x?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>I?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>Q?/span>?/span>?/span>?/span>?/span>退?/span>?/span>?/span>?/span>?/span>I?/span>?/span>q?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>Ti3 ?/span>E?/span>?/span>?/span>?/span>?/span>Ti4 ?/span>?/span>?/span>?/span>?/span>Q?/span>?/span>?/span>?/span>Ar/H2?/span>?/span>?/span>退?/span>Q?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>?/span>